μPG501，非常適合用於少量光罩的繪圖工作。價格不但經濟實惠且操作簡單容易。雖然是小型繪圖機，但是可接受 3D 曝光的模式，也可在光罩中製造複雜的 3D 構造。

Designed with the focus on high performance at an affordable price, the µPG 501 is the perfect solution for prototyping such as MEMS, integrated Optics,microfluids, Lab-on-a-Chip devices and mask making.
The system has the ability to write structures down to 1 µm at a speed of 50 mm2 /min. This equals an exposure time of less than one hour for a 2“x 2“ pattern. The integrated exposure wizard (GUI) guides the operator through the complete procedure: Load the substrate, select the design and start the exposure. The µPG 501 was designed to fit even into the smallest R&D laboratories, and requires only power connection and an air pressure supply to operate.
The µPG 501 is equipped with a high power LED light source, providing exceptional reliability and very long lifetime. Available wavelengths are 390 or 405 nm. Other wavelengths may be available up on request. The µPG 501 can expose standard positive and negative photo resists as well as UV-resists such as SU8. Since the intensity dose is not limited, the system is suitable for applications which require thick resists. Utilizing our sophisticated Gray Scale Exposure technology, the µPG 501 has the ability to create 3 dimensional structures such as blazed gratings or micro-lenses.