研究開發用的雷射直寫製程系統 : DWL 66+
以低價格實現高精密度，能於立體構造上進行3D的繪畫方式

DWL 66+ 適用於光罩的試製和直接進行描寫的研究開發。低價格且高精度的雷射圖形直寫系統。最大基板尺寸為 200mm × 200mm，最小繪畫尺寸 0.6μm 。能在複雜的立體構造進行 3D 的繪畫。
DWL 66+ 的基本顧客，包括全世界超過 100 家以上的頂尖大學和研究機構。DWL 66+ 的系統機能，包括密切協助這些機構團體以進行各項的開發。

The DWL 66+ laser lithography system is an economical, high resolution pattern generator for low volume mask making and direct writing. The capabilities and flexibility of this system make it the ultimate lithographic research tool in MEMS, BioMEMS, Micro Optics, ASICs, Micro Fluidics, Sensors, CGHs, and all other applications that require microstructures.

The customer base of the DWL 66+ includes over 100 leading universities and research facilities world wide. Many of the system features have been developed in close cooperation with these institutions.