ULTRA系統針對半導體產業製造光罩，提供了經濟實惠的雷射直寫生產光罩方案，擁有高通量、高精度和結構均勻性，以及極其精確的對準功能。由於其現代化、緊湊的結構，您可以輕鬆將系統整合到現有的光罩製造基礎設施中。

現今，光罩在半導體器件製造中仍然是重要的組成環節，被廣泛應用在電源、微控制器、LED照明、物聯網、微機電、汽車工業等領域。 ULTRA系統支持結構尺寸低於500nm，速度最快高達每分鐘325 mm²或580 mm²（取決於寫入模式），同時具有優秀的均勻性、高品質圖像、多層套刻精度以及重複定位精度。

The ULTRA specifically addresses the production of mature semiconductor photomasks. It provides an economical mask writer solution with all the features you require for high throughput, high precision and structure uniformity, and extremely accurate alignment. With its modern, compact build, you can easily incorporate the system into an existing mask shop infrastructure.

Mature photomasks continue to be a vital component in semiconductor device fabrication, being used in power management, microcontrollers, LED lighting, the IOT, MEMS, the automotive industry, to name but a few. The ULTRA serves this market with structure sizes down to 500 nm and write speeds up to 325 mm2 or 580 mm2 per minute depending on write mode, while featuring excellent values for CD, image quality, overlay, and registration.