NanoFrazor Scholar

NanoFrazor Explore

科研型熱探針掃描光刻機
熱探針掃描光刻機

THERMAL SCANNING PROBE LITHOGRAPHY TOOL
經濟實惠的系統,適合奈米加工的學術研究

THERMAL SCANNING PROBE LITHOGRAPHY TOOL
同時具備雷射直寫和熱探針光刻功能

NanoFrazor® Scholar特別適合奈米加工研究的學術單位團體,用於在1D/2D 材料,例如量子點和奈米陣列上製作量子器件的奈米結構,其獨特的功能使能夠應用任何新材料。例如,灰度光子學設備、奈米流道結構或用於細胞生長的仿生基質等進階應用;通過加熱探針對材料進行局部改性,例如化學反應和物理相變。

原位成像具有兩個獨特的功能,無標記覆寫(markerless overlay), 及在寫入過程中與目標圖形隨時校正,立即調整參數的閉環光刻(closed-loop);可以使實現複雜的2.5D(灰度)及垂直精度2nm,對加熱的奈米級針端進行快速精確的控制,實現了其他設備無法突破的創新。

此系統技術的研發是從IBM research Zürich開始,經過20多年深入研究的成果,到目前由海德堡Heidelberg Instruments Nano進行。 NanoFrazor® 硬體和軟件不斷進步,以擴大設備功能和效能及其應用範圍。我們專業的團隊繼續為不同的應用開發和優化圖案轉移工藝,我們會不斷進步實現最完美的獨家技術,用以支持我們的客戶。

The NanoFrazor® Scholar is particularly suitable for academic research groups requiring an affordable system for nanofabrication. NanoFrazor® Scholar is used for nanopatterning of quantum devices on 1D/2D materials such as quantum dots, Dolan bridges and Josephson junctions, and nanoscale arrays. Its unique capabilities enable new devices in new materials. For example, it is used for advanced applications such as grayscale photonics devices, nanofluidics structures or biomimetic substrates for cell growth; local modification of materials by heat, e.g. chemical reactions and physical phase changes.

In-situ imaging enables two unique features: markerless overlay, and comparison of the written and target patterns during writing so the parameters can be immediately adjusted. This approach, called closed-loop lithography, results in sub-2 nm vertical precision for 2.5D (grayscale) shapes of any complexity. Fast and precise control of a heated nanoscale tip enables innovation not otherwise feasible.

The technology behind the system is the result of more than 20 years of intensive research and development (R&D) that started at IBM Research Zürich and now takes place at Heidelberg Instruments Nano. The NanoFrazor® hardware and software are constantly advancing to extend the capabilities and performance of the tool and its range of applications. Our dedicated team of experts continues to develop and optimize the pattern transfer processes for different applications. We compile this know-how in a growing library of best practices and protocols to support our customers.

NanoFrazor® Explore是最經濟實惠熱探針光刻工具,用於1D/2D材料,例如量子點、量子器件的奈米結構,其獨特的功能使能夠應用任何新材料。例如,灰度光子學設備、奈米流道結構或用於細胞生長的仿生基質等進階應用;通過加熱探針對材料進行局部改性,例如化學反應和物理相變。

使用雷射直寫模組,可以在每個步驟中快速寫入同一膠層做出微奈米結構。原位成像實現兩個獨特的功能:無標記覆寫(markerless overlay), 及在寫入過程中與目標圖形隨時校正,立即調整參數的閉環光刻(closed-loop);可以使任何複雜的2.5D(灰度)對加熱的奈米級針端進行快速精確的控制,實現了其他設備無法突破的創新。

此系統技術的研發是從IBM research Zürich開始,經過20多年深入研究的成果,到目前由海德堡Heidelberg Instruments Nano進行。 NanoFrazor®硬體和軟件不斷進步,以擴大設備功能和效能及其應用範圍。我們專業的團隊繼續為不同的應用開發和優化圖案轉移工藝,我們會不斷進步實現最完美的獨家技術,用以支持我們的客戶。

NanoFrazor® Explore is the first commercial thermal scanning probe lithography tool. NanoFrazor® Explore is used for nanopatterning of quantum devices on 1D/2D materials, such as quantum dots, Dolan bridges and Josephson junctions, and nanoscale arrays. Its unique capabilities enable new devices in new materials. For example, it is used for advanced applications such as grayscale photonics devices, nanofluidics structures or biomimetic substrates for cell growth; local modification of materials by heat, e.g. chemical reactions and physical phase changes.

With the direct laser sublimation module, nano- and microstructures are now seamlessly and quickly written into the same resist layer in a single fabrication step. In-situ imaging enables two unique features: markerless overlay, and comparison of the written and target patterns during writing, so the parameters can be immediately adjusted. This approach, called closed-loop lithography, results in sub-2 nm vertical precision for 2.5D (grayscale) shapes of any complexity. Fast and precise control of a heated nanoscale tip enables innovation not otherwise feasible.

The technology behind the system is the result of more than 20 years of intensive research and development (R&D) that started at IBM Research Zürich, and now happens at Heidelberg Instruments Nano. The NanoFrazor® hardware and software are constantly advancing to extend the capabilities and performance of the tool and its range of applications. Our dedicated team of experts keeps developing and optimizing the pattern transfer processes for different applications. We compile this know-how in a growing collection of best practices and protocols to support our customers.

KEY FEATURES

Substrate size: 1 x 1 mm² to 50 x 50 mm² (100 x 100 mm² possible) Minimum Structure size: down to 20nm Write speed (typical scan speed): 0.5 [mm/s] 10 nm lateral resolution 1 nm vertical resolution (3D grayscale) Thermal Scanning Probe Lithography Non-invasive Lithography Markerless Overlay and Stitching (< 25 nm accuracy) vibration isolation included dedicated glovebox available

Substrate size: 1 x 1 mm² to 100 x 100 mm² ( 150 x 150 mm² possible) Minimum Structure size: 15nm(Probe)/600nm(Laser) Write speed (typical scan speed): 1[mm/s]( Probe)/5[mm/s](Laser) 10 nm lateral resolution 1 nm vertical resolution (3D grayscale) Thermal Scanning Probe Lithography DLS integrated laser writer module Non-invasive Lithography Markerless Overlay and Stitching (< 25 nm accuracy)

Application

2D materials Quantum devices Nanowire devices Nanofluidics Surface functionalizations

2D materials Quantum devices Nanowire devices Nanofluidics Surface functionalizations