| 適用範圍 Applications : |
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適用於Shadow mask 類產品，用一般燈光的光源進行接觸式負片玻璃光罩製程。 |
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適用於365nm 波長紫外光源，包含高壓汞燈與鹵素燈。 |
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光譜感度 Spectra sensitivity : |
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| 特色 Features : |
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忠實呈現母片圖形。 |
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優越的顯影穩定性，穩定光罩圖形。 |
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減少在顯影製程階段所產生的缺點。 |
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製程條件 Processing conditions: |
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Processing |
Chemical used |
Temp. |
Time |
Development |
Developer............ DE-200
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20℃ |
3 minutes with continuous
agitation |
Stop bath |
Acetic acid (3%) |
18~21℃ |
10 to 30 seconds |
Fix |
Fixer...................... CFL-881
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18~21℃ |
3 minutes
with continuous agitation |
Wash |
Flowing water |
18~21℃ |
10 minutes
or more |
Drying |
Clean air 20 to 50℃ |
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Designated safe light : Please ask for details |
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業務聯絡人 請洽詢：(03)550-0499 江先生(Wesley) 
E-mail |
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