產業界也可利用的標準設備: DWL 200
高速、高靈活度，可自動加載基板，也可裝載部分其他系統

DWL200 雷射罩繪圖機高速且靈活的機台；在製作光罩和直寫上擁有高解析度模組生成程式。直寫範圍可達200mm×200mm2(mm平方)。
適用於MEMS, BioMEMS, Micro Optics(微光學), ASICs, Micro Fluidics(微流體力學), Sensors(傳感器), CGHs，和要求微結構的其它所有應用。

除了高解析度2D模組之外, 系統更進步至可能並且創造複雜的3D 結構，在厚實的光阻劑建立單一通道。這個特點使定製的微光學能很快且容易的以折射或繞射的元素製造。針對這些結構設計的過程，是特別為這種情況而設計轉換軟體來實際支援這些3D 應用。

The DWL 200 laser lithography system is a fast and flexible, high resolution pattern generator for mask making and direct writing. With a write area of up to 200 x 200 mm2 the system is the perfect solution for fast patterning of masks and wafers in MEMS, BioMEMS, Micro Optics, ASICs, Micro Fluidics, Sensors, CGHs, and all other applications that require microstructures.

In addition to high resolution 2D patterns, the state of the art technology of the system can also create complex 3D structures in thick photoresist with a single pass. This feature enables quick and easy fabrication of custom made micro-optics with refractive or diffractive elements. The design process for these structures is supported by conversion software specifically designed for these 3D applications.